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Hall effect in charged conducting ferroelectric domain walls.

Authors :
Campbell MP
McConville JP
McQuaid RG
Prabhakaran D
Kumar A
Gregg JM
Source :
Nature communications [Nat Commun] 2016 Dec 12; Vol. 7, pp. 13764. Date of Electronic Publication: 2016 Dec 12.
Publication Year :
2016

Abstract

Enhanced conductivity at specific domain walls in ferroelectrics is now an established phenomenon. Surprisingly, however, little is known about the most fundamental aspects of conduction. Carrier types, densities and mobilities have not been determined and transport mechanisms are still a matter of guesswork. Here we demonstrate that intermittent-contact atomic force microscopy (AFM) can detect the Hall effect in conducting domain walls. Studying YbMnO <subscript>3</subscript> single crystals, we have confirmed that p-type conduction occurs in tail-to-tail charged domain walls. By calibration of the AFM signal, an upper estimate of ∼1 × 10 <superscript>16</superscript> cm <superscript>-3</superscript> is calculated for the mobile carrier density in the wall, around four orders of magnitude below that required for complete screening of the polar discontinuity. A carrier mobility of∼50 cm <superscript>2</superscript> V <superscript>-1</superscript> s <superscript>-1</superscript> is calculated, about an order of magnitude below equivalent carrier mobilities in p-type silicon, but sufficiently high to preclude carrier-lattice coupling associated with small polarons.

Details

Language :
English
ISSN :
2041-1723
Volume :
7
Database :
MEDLINE
Journal :
Nature communications
Publication Type :
Academic Journal
Accession number :
27941794
Full Text :
https://doi.org/10.1038/ncomms13764