The effect of photodynamic therapy and polymer solution containing nano-particles of Ag /ZnO on push-out bond strength of the sealers AH-Plus and MTA Fillapex.

Background: The aim of this in vitro study was to examine and compare the effect of photodynamic therapy and solution containing nano particles Ag/ZnO on adhesion of endodontic sealers to dentinal walls of human root canal.
Material and Methods: Ninty single-rooted human teeth were selected and their clinical crown was cut from the cemento-enamel junction zone. Canals were prepared by RaCe rotary system and the smear layer was removed using 17% EDTA and 5.25% NaOCl. Samples were randomly divided into two groups of AH Plus and MTA Fillapex based on the sealer type and each group based on antimicrobial method was divided into two sub-groups of photodynamic therapy and polymer containing nano particles of Ag / ZnO and a control sub-group (N = 15). After obturation of canals with gutta-percha and sealers mentioned, the samples were incubated for a week at a humidity of 95% and 37°C and then 2mm thick discs were prepared from the middle region of roots for Push-out test. The maximum failure force was recorded in newton and converted to MPa. Then, 3 random specimens of each subgroup were evaluated by scanning electron microscopy. Statistical analysis was performed by Two way ANOVA and ( P <0.05) was considered significant.
Results: The highest (4.84 ± 1.63) and lowest (0.16 ± 0.075) push-out bond strength values were obtained in (AH Plus-PDT) and (MTA Fillapex-Ag/ZnO) respectively. Independent of antimicrobial method, AH Plus bond strength was significantly higher than the MTA Fillapex ( p <0.001). For both sealers, PDT increased the bond strength significantly ( p <0.001).
Conclusions: Photodynamic therapy has a positive effect on the bond strength of AH Plus and MTA Fillapex sealers. Key words: AH Plus, MTA Fillapex, Nano particles, Photodynamic therapy, Push-out.
Competing Interests: Conflict of interest statement:The authors declare they have no conflicts of interest.