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Strain-Tunable Electronic Properties and Band Alignments in GaTe/C 2 N Heterostructure: a First-Principles Calculation.

Authors :
Li XH
Wang BJ
Cai XL
Yu WY
Zhu YY
Li FY
Fan RX
Zhang YS
Ke SH
Source :
Nanoscale research letters [Nanoscale Res Lett] 2018 Sep 26; Vol. 13 (1), pp. 300. Date of Electronic Publication: 2018 Sep 26.
Publication Year :
2018

Abstract

Recently, GaTe and C <subscript>2</subscript> N monolayers have been successfully synthesized and show fascinating electronic and optical properties. Such hybrid of GaTe with C <subscript>2</subscript> N may induce new novel physical properties. In this work, we perform ab initio simulations on the structural, electronic, and optical properties of the GaTe/C <subscript>2</subscript> N van der Waals (vdW) heterostructure. Our calculations show that the GaTe/C <subscript>2</subscript> N vdW heterostructure is an indirect-gap semiconductor with type-II band alignment, facilitating an effective separation of photogenerated carriers. Intriguingly, it also presents enhanced visible-UV light absorption compared to its components and can be tailored to be a good photocatalyst for water splitting at certain pH by applying vertical strains. Further, we explore specifically the adsorption and decomposition of water molecules on the surface of C <subscript>2</subscript> N layer in the heterostructure and the subsequent formation of hydrogen, which reveals the mechanism of photocatalytic hydrogen production on the 2D GaTe/C <subscript>2</subscript> N heterostructure. Moreover, it is found that in-plane biaxial strains can induce indirect-direct-indirect, semiconductor-metal, and type II to type I or type III transitions. These interesting results make the GaTe/C <subscript>2</subscript> N vdW heterostructure a promising candidate for applications in next generation of multifunctional optoelectronic devices.

Details

Language :
English
ISSN :
1931-7573
Volume :
13
Issue :
1
Database :
MEDLINE
Journal :
Nanoscale research letters
Publication Type :
Academic Journal
Accession number :
30259233
Full Text :
https://doi.org/10.1186/s11671-018-2708-x