A table-top EUV focusing optical system with high energy density using a modified Schwarzschild objective and a laser-plasma light source.

For investigating extreme ultraviolet (EUV) damage on optics, a table-top EUV focusing optical system was developed in the laboratory. Based on a modified Schwarzschild objective with a large numerical aperture and a laser-plasma light source, this optical system can generate a focusing spot with the maximum energy density of 2.27 J/cm ² at the focal plane of the objective at the wavelength of 13.5 nm. The structures and the characterized properties of this optical system are presented in this paper. For testing the performance of this setup, single-shot EUV damage tests were carried out on an optical substrate of CaF ₂ and a gold thin film. The damage thresholds and morphologies of these samples were given and discussed with former research studies.