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Tailored Langmuir-Schaefer Deposition of Few-Layer MoS 2 Nanosheet Films for Electronic Applications.
- Source :
-
Langmuir : the ACS journal of surfaces and colloids [Langmuir] 2019 Jul 30; Vol. 35 (30), pp. 9802-9808. Date of Electronic Publication: 2019 Jul 18. - Publication Year :
- 2019
-
Abstract
- Few-layer MoS <subscript>2</subscript> films stay at the forefront of current research of two-dimensional materials. At present, continuous MoS <subscript>2</subscript> films are prepared by chemical vapor deposition (CVD) techniques. Herein, we present a cost-effective fabrication of the large-area spatially uniform films of few-layer MoS <subscript>2</subscript> flakes using a modified Langmuir-Schaefer technique. The compression of the liquid-phase exfoliated MoS <subscript>2</subscript> flakes on the water subphase was used to form a continuous layer, which was subsequently transferred onto a submerged substrate by removing the subphase. After vacuum annealing, the electrical sheet resistance dropped to a level of 10 kΩ/sq, being highly competitive with that of CVD-deposited MoS <subscript>2</subscript> nanosheet films. In addition, a consistent fabrication protocol of the large-area conductive MoS <subscript>2</subscript> films was established. The morphology and electrical properties predetermine these films to advanced detecting, sensing, and catalytic applications. A large number of experimental techniques were used to characterize the exfoliated few-layer MoS <subscript>2</subscript> flakes and to elucidate the formation of the few-layer MoS <subscript>2</subscript> Langmuir film.
Details
- Language :
- English
- ISSN :
- 1520-5827
- Volume :
- 35
- Issue :
- 30
- Database :
- MEDLINE
- Journal :
- Langmuir : the ACS journal of surfaces and colloids
- Publication Type :
- Academic Journal
- Accession number :
- 31282679
- Full Text :
- https://doi.org/10.1021/acs.langmuir.9b01000