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Composition and properties of RF-sputter deposited titanium dioxide thin films.

Authors :
Daughtry J
Alotabi AS
Howard-Fabretto L
Andersson GG
Source :
Nanoscale advances [Nanoscale Adv] 2020 Dec 08; Vol. 3 (4), pp. 1077-1086. Date of Electronic Publication: 2020 Dec 08 (Print Publication: 2021).
Publication Year :
2020

Abstract

The photocatalytic properties of titania (TiO <subscript>2</subscript> ) have prompted research utilising its useful ability to convert solar energy into electron-hole pairs to drive novel chemistry. The aim of the present work is to examine the properties required for a synthetic method capable of producing thin TiO <subscript>2</subscript> films, with well defined, easily modifiable characteristics. Presented here is a method of synthesis of TiO <subscript>2</subscript> nanoparticulate thin films generated using RF plasma capable of homogenous depositions with known elemental composition and modifiable properties at a far lower cost than single-crystal TiO <subscript>2</subscript> . Multiple depositions regimes were examined for their effect on overall chemical composition and to minimise the unwanted contaminant, carbon, from the final film. The resulting TiO <subscript>2</subscript> films can be easily modified through heating to further induce defects and change the electronic structure, crystallinity, surface morphology and roughness of the deposited thin film.<br />Competing Interests: There are no conflicts to declare.<br /> (This journal is © The Royal Society of Chemistry.)

Details

Language :
English
ISSN :
2516-0230
Volume :
3
Issue :
4
Database :
MEDLINE
Journal :
Nanoscale advances
Publication Type :
Academic Journal
Accession number :
36133287
Full Text :
https://doi.org/10.1039/d0na00861c