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Mesoporous Metastable CuTe 2 Semiconductor.

Authors :
Ashok A
Vasanth A
Nagaura T
Setter C
Clegg JK
Fink A
Masud MK
Hossain MS
Hamada T
Eguchi M
Phan HP
Yamauchi Y
Source :
Journal of the American Chemical Society [J Am Chem Soc] 2023 Nov 01; Vol. 145 (43), pp. 23461-23469. Date of Electronic Publication: 2023 Oct 18.
Publication Year :
2023

Abstract

Binary metastable semiconductor materials offer exciting possibilities in the field of optoelectronics, such as photovoltaics, tunable photosensors, and detectors. However, understanding their properties and translating them into practical applications can sometimes be challenging, owing to their thermodynamic instability. Herein, we report a temperature-controlled crystallization technique involving electrochemical deposition to produce metastable CuTe <subscript>2</subscript> thin films that can reliably function under ambient conditions. A series of in situ heating/cooling cycle tests from room temperature to 200 °C followed by spectral, morphological, and compound analyses (such as ultraviolet-visible light spectroscopy, X-ray diffraction (XRD) analysis, and X-ray photoelectron spectroscopy (XPS)) suggest that the seeding electrodes play a key role in the realization of the metastable phase in CuTe <subscript>2</subscript> films. In particular, CuTe <subscript>2</subscript> films deposited on Al electrodes exhibit superior crystallinity and long-term stability compared with those grown on a Au substrate. The XRD data of thermally annealed CuTe <subscript>2</subscript> thin films deposited on Al show a markedly sharp peak, indicating significantly increased crystal-domain sizes. Our method can be used to achieve the metastable phase of CuTe <subscript>2</subscript> with a bandgap of 1.67 eV and offers outstanding photoresponsivity under different illumination conditions.

Details

Language :
English
ISSN :
1520-5126
Volume :
145
Issue :
43
Database :
MEDLINE
Journal :
Journal of the American Chemical Society
Publication Type :
Academic Journal
Accession number :
37851534
Full Text :
https://doi.org/10.1021/jacs.3c05846