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ToF-SIMS analysis of ultrathin films and their fragmentation patterns.

Authors :
Muramoto S
Graham DJ
Castner DG
Source :
Journal of vacuum science & technology. A, Vacuum, surfaces, and films : an official journal of the American Vacuum Society [J Vac Sci Technol A] 2024 Mar; Vol. 42 (2), pp. 023416. Date of Electronic Publication: 2024 Feb 05.
Publication Year :
2024

Abstract

Organic thin films are of great interest due to their intriguing interfacial and functional properties, especially for device applications such as thin-film transistors and sensors. As their thickness approaches single nanometer thickness, characterization and interpretation of the extracted data become increasingly complex. In this study, plasma polymerization is used to construct ultrathin films that range in thickness from 1 to 20 nm, and time-of-flight secondary ion mass spectrometry coupled with principal component analysis is used to investigate the effects of film thickness on the resulting spectra. We demonstrate that for these cross-linked plasma polymers, at these thicknesses, the observed trends are different from those obtained from thicker films with lower degrees of cross-linking: contributions from ambient carbon contamination start to dominate the mass spectrum; cluster-induced nonlinear enhancement in secondary ion yield is no longer observed; extent of fragmentation is higher due to confinement of the primary ion energy; and the size of the primary ion source also affects fragmentation (e.g., Bi <subscript>1</subscript> versus Bi <subscript>5</subscript> ). These differences illustrate that care must be taken in choosing the correct primary ion source as well as in interpreting the data.<br />Competing Interests: The authors have no conflicts to disclose.<br /> (© 2024 Author(s).)

Details

Language :
English
ISSN :
0734-2101
Volume :
42
Issue :
2
Database :
MEDLINE
Journal :
Journal of vacuum science & technology. A, Vacuum, surfaces, and films : an official journal of the American Vacuum Society
Publication Type :
Academic Journal
Accession number :
38328692
Full Text :
https://doi.org/10.1116/6.0003249