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Computational Screening of Promising Deep-Ultraviolet Light Emitters.

Authors :
Xu X
Liang HP
Huang QS
Liu Z
Zhao BQ
Xu SY
Li CN
Zhou ZK
Li J
Wei SH
Zhang X
Source :
Journal of the American Chemical Society [J Am Chem Soc] 2024 May 08; Vol. 146 (18), pp. 12864-12876. Date of Electronic Publication: 2024 Apr 26.
Publication Year :
2024

Abstract

Deep-ultraviolet (DUV) light sources are technologically highly important, but DUV light-emitting materials are extremely rare; AlN and its alloys are the only materials known so far, significantly limiting the chemical and structural spaces for materials design. Here, we perform a high-throughput computational search for DUV light emitters based on a set of carefully designed screening criteria relating to the sophisticated electronic structure. In this way, we successfully identify 5 promising material candidates that exhibit comparable or higher radiative recombination coefficients than AlN, including BeGeN <subscript>2</subscript> , Mg <subscript>3</subscript> NF <subscript>3</subscript> , KCaBr <subscript>3</subscript> , KHS, and RbHS. Further, we unveil the unique features in the atomic and electronic structures of DUV light emitters and elucidate the fundamental genetic reasons why DUV light emitters are extremely rare. Our study not only guides the design and synthesis of efficient DUV light emitters but also establishes the genetic nature of ultrawide-band-gap semiconductors in general.

Details

Language :
English
ISSN :
1520-5126
Volume :
146
Issue :
18
Database :
MEDLINE
Journal :
Journal of the American Chemical Society
Publication Type :
Academic Journal
Accession number :
38670931
Full Text :
https://doi.org/10.1021/jacs.4c03711