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Engineering Oxide Epitaxy beyond Substrate Constraint.
- Source :
-
Nano letters [Nano Lett] 2024 Jul 03; Vol. 24 (26), pp. 8171-8178. Date of Electronic Publication: 2024 Jun 24. - Publication Year :
- 2024
-
Abstract
- Orientation engineering is a crucial aspect of thin film growth, and it is rather challenging to engineer film epitaxy beyond the substrate constraint. Guided by density functional theory calculations, we use SrRuO <subscript>3</subscript> (SRO) as a buffer layer and successfully deposit [111]-oriented CoFe <subscript>2</subscript> O <subscript>4</subscript> (CFO) on [001]-, [110]-, and [111]-oriented SrTiO <subscript>3</subscript> (STO) substrates. This enables subsequent growth of [111]-oriented functional oxides, such as PbTiO <subscript>3</subscript> (PTO), overcoming the constraint of the substrate. This strategy is quite general and applicable to lanthanum aluminate and yttria-stabilized zirconia substrates as well. X-ray Φ scans and atomic resolution aberration-corrected scanning transmission electron microscopy (AC-STEM) reveal detailed epitaxial relations in each of the cases, with four variants of [111]-CFO found on [001]-STO and two variants found on [110]-STO, formed to mitigate the large lattice misfit strain between the film and substrate. Our strategy thus provides a general pathway for orientation engineering of oxide epitaxy beyond substrate constraint.
Details
- Language :
- English
- ISSN :
- 1530-6992
- Volume :
- 24
- Issue :
- 26
- Database :
- MEDLINE
- Journal :
- Nano letters
- Publication Type :
- Academic Journal
- Accession number :
- 38912705
- Full Text :
- https://doi.org/10.1021/acs.nanolett.4c02128