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Engineering Oxide Epitaxy beyond Substrate Constraint.

Authors :
Cheng M
Li C
Wang Q
Ding L
Wang X
Zhong G
Li J
Source :
Nano letters [Nano Lett] 2024 Jul 03; Vol. 24 (26), pp. 8171-8178. Date of Electronic Publication: 2024 Jun 24.
Publication Year :
2024

Abstract

Orientation engineering is a crucial aspect of thin film growth, and it is rather challenging to engineer film epitaxy beyond the substrate constraint. Guided by density functional theory calculations, we use SrRuO <subscript>3</subscript> (SRO) as a buffer layer and successfully deposit [111]-oriented CoFe <subscript>2</subscript> O <subscript>4</subscript> (CFO) on [001]-, [110]-, and [111]-oriented SrTiO <subscript>3</subscript> (STO) substrates. This enables subsequent growth of [111]-oriented functional oxides, such as PbTiO <subscript>3</subscript> (PTO), overcoming the constraint of the substrate. This strategy is quite general and applicable to lanthanum aluminate and yttria-stabilized zirconia substrates as well. X-ray Φ scans and atomic resolution aberration-corrected scanning transmission electron microscopy (AC-STEM) reveal detailed epitaxial relations in each of the cases, with four variants of [111]-CFO found on [001]-STO and two variants found on [110]-STO, formed to mitigate the large lattice misfit strain between the film and substrate. Our strategy thus provides a general pathway for orientation engineering of oxide epitaxy beyond substrate constraint.

Details

Language :
English
ISSN :
1530-6992
Volume :
24
Issue :
26
Database :
MEDLINE
Journal :
Nano letters
Publication Type :
Academic Journal
Accession number :
38912705
Full Text :
https://doi.org/10.1021/acs.nanolett.4c02128