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Agglomeration and Dendritic Growth of Cu/Ti/Si Thin Film.
- Source :
- Journal of Nanomaterials; 2014, p1-8, 8p
- Publication Year :
- 2014
-
Abstract
- Agglomeration and the transformation from random fractal to dendritic growth have been observed during Cu/Ti/Si thin film annealing. The experimental results show that the annealing temperature, film thickness, and substrate thickness influenced the agglomeration and dendritic growth. Multifractal spectrum is used to characterize the surface morphology quantificationally. The shapes of the multifractal spectra are hook-like to the left. Value of Δα increases with the annealing temperature rising, and Δf increases from 500°C to 700°C but reduces from 700°C to 800°C. The dendritic patterns with symmetrical branches are generated in the surfaces when the thin films were annealed at 800°C. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 16874110
- Database :
- Complementary Index
- Journal :
- Journal of Nanomaterials
- Publication Type :
- Academic Journal
- Accession number :
- 100530655
- Full Text :
- https://doi.org/10.1155/2014/518520