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O3-sourced atomic layer deposition of high quality Al2O3 gate dielectric for normally-off GaN metal-insulator-semiconductor high-electron-mobility transistors.
- Source :
- Applied Physics Letters; 1/19/2015, Vol. 106 Issue 3, p1-5, 5p, 6 Graphs
- Publication Year :
- 2015
-
Abstract
- High quality Al<subscript>2</subscript>O<subscript>3</subscript> film grown by atomic layer deposition (ALD), with ozone (O<subscript>3</subscript>) as oxygen source, is demonstrated for fabrication of normally-off AlGaN/GaN metal-insulator-semiconductor high-electron-mobility transistors (MIS-HEMTs). Significant suppression of Al-O-H and Al-Al bonds in ALD-Al<subscript>2</subscript>O<subscript>3</subscript> has been realized by substituting conventional H2O source with O<subscript>3</subscript>. A high dielectric breakdown E-field of 8.5 MV/cm and good TDDB behavior are achieved in a gate dielectric stack consisting of 13-nm O3-Al<subscript>2</subscript>O<subscript>3</subscript> and 2-nm H<subscript>2</subscript>O-Al<subscript>2</subscript>O<subscript>3</subscript> interfacial layer on recessed GaN. By using this 15-nm gate dielectric and a high-temperature gate-recess technique, the density of positive bulk/interface charges in normally-off AlGaN/GaN MIS-HEMTs is remarkably suppressed to as low as 0.9 x 10<superscript>12</superscript>cm<subscript>-2</subscript>, contributing to the realization of normally-off operation with a high threshold voltage of +1.6 V and a low specific ON-resistance R<subscript>ON,sp</subscript> of 0.49 mΩ cm². [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 00036951
- Volume :
- 106
- Issue :
- 3
- Database :
- Complementary Index
- Journal :
- Applied Physics Letters
- Publication Type :
- Academic Journal
- Accession number :
- 100730175
- Full Text :
- https://doi.org/10.1063/1.4906601