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Signature Driven Hierarchical Post-Manufacture Tuning of RF Systems for Performance and Power.

Authors :
Banerjee, Aritra
Chatterjee, Abhijit
Source :
IEEE Transactions on Very Large Scale Integration (VLSI) Systems; Feb2015, Vol. 23 Issue 2, p342-355, 14p
Publication Year :
2015

Abstract

Integration of RF circuits in deeply scaled CMOS technologies and severe process variation in those technology nodes result in poor manufacturing yield. A post-manufacture tuning approach for yield improvement of RF systems is developed in this paper that uses hierarchical behavioral models of the RF systems. The proposed method first determines module-level performances from the system-level response (signature) to an applied test using top-down model diagnosis. Then, constrained optimization is performed to determine the best module-level tuning parameter values that satisfy system-level specifications (bottom-up analysis) in a power-conscious manner. Both top-down and bottom-up analysis techniques are supported by hierarchical RF behavioral models. The relationship between module-level tuning parameters and module-level performance metrics changes from instance to instance depending on amount of process variation and this factor is included in the proposed tuning procedure. A key benefit of the proposed approach is that only a single-test application is needed at a fixed number of tuning knob settings resulting in reduction in tuning time. The efficiency of the proposed technique is demonstrated using simulation results and hardware experiment. [ABSTRACT FROM PUBLISHER]

Details

Language :
English
ISSN :
10638210
Volume :
23
Issue :
2
Database :
Complementary Index
Journal :
IEEE Transactions on Very Large Scale Integration (VLSI) Systems
Publication Type :
Academic Journal
Accession number :
100777026
Full Text :
https://doi.org/10.1109/TVLSI.2014.2309114