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Impact of etch stop layer on negative bias illumination stress of amorphous Indium Gallium Zinc Oxide transistors.
- Source :
- 2014 44th European Solid State Device Research Conference (ESSDERC); 2014, p302-304, 3p
- Publication Year :
- 2014
Details
- Language :
- English
- ISBNs :
- 9781479943784
- Database :
- Complementary Index
- Journal :
- 2014 44th European Solid State Device Research Conference (ESSDERC)
- Publication Type :
- Conference
- Accession number :
- 101226128
- Full Text :
- https://doi.org/10.1109/ESSDERC.2014.6948820