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Influence of the substrate temperature during deposition on film characteristics of copper phthalocyanine and field-effect transistor properties.
- Source :
- Applied Physics A: Materials Science & Processing; 2003, Vol. 77 Issue 3/4, p367, 4p
- Publication Year :
- 2003
-
Abstract
- In this paper, we employ different substrate temperatures during the deposition process and observe a highly ordered structure and strong orientation of copper phthalocyanine (CuPc) molecules on Si/SiO[SUB2] by using X-ray-diffraction and transmission electron microscopy analysis. The results show the effect of CuPc morphology at different substrate temperatures on the organic field-effect-transistor performance. When the substrate temperature for deposition of CuPc is 120 °C, a mobility of 3.75 × 10[SUP-3] cm[SUP2]/V s can be obtained. [ABSTRACT FROM AUTHOR]
- Subjects :
- COPPER
PHTHALOCYANINES
X-ray diffraction
TRANSMISSION electron microscopy
Subjects
Details
- Language :
- English
- ISSN :
- 09478396
- Volume :
- 77
- Issue :
- 3/4
- Database :
- Complementary Index
- Journal :
- Applied Physics A: Materials Science & Processing
- Publication Type :
- Academic Journal
- Accession number :
- 10284209
- Full Text :
- https://doi.org/10.1007/s00339-003-2169-6