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Influence of the substrate temperature during deposition on film characteristics of copper phthalocyanine and field-effect transistor properties.

Authors :
Xiao, K.
Liu, Y.
Yu, G.
Zhu, D.
Source :
Applied Physics A: Materials Science & Processing; 2003, Vol. 77 Issue 3/4, p367, 4p
Publication Year :
2003

Abstract

In this paper, we employ different substrate temperatures during the deposition process and observe a highly ordered structure and strong orientation of copper phthalocyanine (CuPc) molecules on Si/SiO[SUB2] by using X-ray-diffraction and transmission electron microscopy analysis. The results show the effect of CuPc morphology at different substrate temperatures on the organic field-effect-transistor performance. When the substrate temperature for deposition of CuPc is 120 °C, a mobility of 3.75 × 10[SUP-3] cm[SUP2]/V s can be obtained. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
09478396
Volume :
77
Issue :
3/4
Database :
Complementary Index
Journal :
Applied Physics A: Materials Science & Processing
Publication Type :
Academic Journal
Accession number :
10284209
Full Text :
https://doi.org/10.1007/s00339-003-2169-6