Back to Search
Start Over
Control of Wafer Temperature Using a Vortex Water-Wall Argon Arc.
- Source :
- IEEE Transactions on Industry Applications; Nov2015 Part 1, Vol. 51 Issue 6, p4802-4807, 6p
- Publication Year :
- 2015
-
Abstract
- This paper describes a constant switching frequency variable duty cycle control strategy that adjusts the current in a vortex water-wall argon arc lamp to achieve wafer temperature tracking in response to a temperature ramp request. The control system includes a model for the following: 1) the outer loop temperature controller; 2) the inner loop current controller; 3) the wafer temperature; and 4) the irradiation produced by the arc lamp in response to arc current changes. The controller design is able to provide a well-behaved arc current and good temperature tracking performance that accommodates for no temperature feedback below 300 °C and a bumpless transfer once temperature feedback is available. [ABSTRACT FROM PUBLISHER]
- Subjects :
- SEMICONDUCTOR wafers
TEMPERATURE
ANNEALING of semiconductors
ARC lamps
ARGON
Subjects
Details
- Language :
- English
- ISSN :
- 00939994
- Volume :
- 51
- Issue :
- 6
- Database :
- Complementary Index
- Journal :
- IEEE Transactions on Industry Applications
- Publication Type :
- Academic Journal
- Accession number :
- 111152717
- Full Text :
- https://doi.org/10.1109/TIA.2015.2451118