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Nanoscale contact resistance of V2O5 xerogel films developed by nanostructured powder.

Authors :
Biswajit Bera
Pradip Sekhar Das
Manjima Bhattacharya
Swapankumar Ghosh
Anoop Kumar Mukhopadhyay
Arjun Dey
Source :
Journal of Physics D: Applied Physics; 3/2/2016, Vol. 49 Issue 8, p1-1, 1p
Publication Year :
2016

Abstract

Here we report the synthesis of V<subscript>2</subscript>O<subscript>5</subscript> nanostructures by a fast, simple, cost-effective, low-temperature chemical process; followed by the deposition of V<subscript>2</subscript>O<subscript>5</subscript> xerogel thin films on a glass substrate by a sol–gel route. Phase analysis, phase transition, microstructural and electronic characterization studies are carried out by x-ray diffraction, texture coefficient analysis, field emission scanning electron microscopy, transmission electron microscopy (TEM), related selected area electron diffraction pattern (SAED) analysis, Fourier transform infrared spectroscopy, thermogravimetry and differential thermal analysis, differential scanning calorimetry, and x-ray photoelectron spectroscopy techniques. Confirmatory TEM and SAED data analysis prove further that in this polycrystalline powder there is a unique localized existence of purely single crystalline V<subscript>2</subscript>O<subscript>5</subscript> powder with a preferred orientation in the (0 1 0) direction. The most interesting result obtained in the present work is that the xerogel thin films exhibit an inherent capability to enhance the intrinsic resistance against contact induced deformations as more external load is applied during the nanoindentation experiments. In addition, both the nanohardness and Young’s modulus of the films are found to be insensitive to load variations (e.g. 1 to 7 mN). These results are explained in terms of microstructural parameters, e.g. porosity and structural configuration. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00223727
Volume :
49
Issue :
8
Database :
Complementary Index
Journal :
Journal of Physics D: Applied Physics
Publication Type :
Academic Journal
Accession number :
112723779
Full Text :
https://doi.org/10.1088/0022-3727/49/8/085303