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Top-gated field-effect LaAlO3/SrTiO3 devices made by ion-irradiation.

Authors :
Hurand, S.
Jouan, A.
Feuillet-Palma, C.
Singh, G.
Lesne, E.
Reyren, N.
Barthélémy, A.
Bibes, M.
Villegas, J. E.
Ulysse, C.
Pannetier-Lecoeur, M.
Malnou, M.
Lesueur, J.
Bergeal, N.
Source :
Applied Physics Letters; 2/1/2016, Vol. 108 Issue 5, p1-5, 5p, 2 Color Photographs, 2 Graphs
Publication Year :
2016

Abstract

We present a method to fabricate top-gated field-effect devices in a LaAlO<subscript>3</subscript>/SrTiO<subscript>3</subscript> two-dimensional electron gas (2-DEG). Prior to the gate deposition, the realisation of micron size conducting channels in the 2-DEG is achieved by an ion-irradiation with high-energy oxygen ions. After identifying the ion fluence as the key parameter that determines the electrical transport properties of the channels, we demonstrate the field-effect operation. At low temperature, the normal state resistance and the superconducting Tc can be tuned over a wide range by a top-gate voltage without any leakage. A superconductor-to-insulator quantum phase transition is observed for a strong depletion of the 2-DEG. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00036951
Volume :
108
Issue :
5
Database :
Complementary Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
112847527
Full Text :
https://doi.org/10.1063/1.4941672