Cite
Atomistic modeling of deactivation and reactivation mechanisms in high-concentration boron profiles.
MLA
Aboy, Maria, et al. “Atomistic Modeling of Deactivation and Reactivation Mechanisms in High-Concentration Boron Profiles.” Applied Physics Letters, vol. 83, no. 20, Nov. 2003, pp. 4166–68. EBSCOhost, https://doi.org/10.1063/1.1628391.
APA
Aboy, M., Pelaz, L., Marqués, L. A., Barbolla, J., Mokhberi, A., Takamura, Y., Griffin, P. B., & Plummer, J. D. (2003). Atomistic modeling of deactivation and reactivation mechanisms in high-concentration boron profiles. Applied Physics Letters, 83(20), 4166–4168. https://doi.org/10.1063/1.1628391
Chicago
Aboy, Maria, Lourdes Pelaz, Luis A. Marqués, Juan Barbolla, Ali Mokhberi, Yayoi Takamura, Peter B. Griffin, and James D. Plummer. 2003. “Atomistic Modeling of Deactivation and Reactivation Mechanisms in High-Concentration Boron Profiles.” Applied Physics Letters 83 (20): 4166–68. doi:10.1063/1.1628391.