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The Influence of Gas Pressure, Voltage, and Frequency on Plasma Propagation in Tube.

Authors :
Qiu, Yunhao
Nie, Lanlan
Xian, Yubin
Liu, Dawei
Yue, Yuanfu
Lu, Xinpei
Source :
IEEE Transactions on Plasma Science; Nov2016 Part 1, Vol. 44 Issue 11, Part 1, p2608-2614, 7p
Publication Year :
2016

Abstract

The influence of gas pressure and electrical parameters on low-pressure plasma has been investigated in this paper. A fast intensified charge-coupled device (ICCD) imaging is utilized to examine the dynamics of plasma bullet and plasma plume length at different pressure and plasma parameters. The experimental results reveal that the gas pressure has great influence on both the length of the plasma and on the propagation velocity of the plasma bullet. By increasing the gas pressure from 15 to 15 000 Pa, both the length of the plasma jet and the velocity of the plasma bullet first increase and then decrease. The maximum value of plasma plume occurred at 100 Pa, in which the propagation velocity gets the maximum value of 5\times 10^6 m/s. Further increasing the gas pressure to 15 000 Pa results in decrease in both the plasma length and bullet velocity. Relative to voltage, the frequency of the applied pulse voltage has a different impact on the plasma propagation at different gas pressures. While a higher voltage induces a longer plasma plume and a faster propagation velocity at both 30 and 2000 Pa, increasing the frequency has little influence on plasma at 30 Pa but reduces the plasma length and propagation velocity observably at 2000 Pa. In addition, an exotic plasma plume structure is observed by ICCD. A possible hypothesis is discussed here to explain this phenomenon. These experiments may lead to a more precise control of the low-pressure plasma, warranted for advanced materials technologies. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00933813
Volume :
44
Issue :
11, Part 1
Database :
Complementary Index
Journal :
IEEE Transactions on Plasma Science
Publication Type :
Academic Journal
Accession number :
119474832
Full Text :
https://doi.org/10.1109/TPS.2016.2598551