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Crystallization behaviors of ultrathin Al-doped HfO2 amorphous films grown by atomic layer deposition.
- Source :
- Chinese Physics B; Feb2017, Vol. 26 Issue 2, p1-1, 1p
- Publication Year :
- 2017
-
Abstract
- In this work, ultrathin pure HfO<subscript>2</subscript> and Al-doped HfO<subscript>2</subscript> films (about 4-nm thick) are prepared by atomic layer deposition and the crystallinities of these films before and after annealing at temperatures ranging from 550 °C to 750 °C are analyzed by grazing incidence x-ray diffraction. The as-deposited pure HfO<subscript>2</subscript> and Al-doped HfO<subscript>2</subscript> films are both amorphous. After 550-°C annealing, a multiphase consisting of a few orthorhombic, monoclinic and tetragonal phases can be observed in the pure HfO<subscript>2</subscript> film while the Al-doped HfO<subscript>2</subscript> film remains amorphous. After annealing at 650 °C and above, a great number of HfO<subscript>2</subscript> tetragonal phases, a high-temperature phase with higher dielectric constant, can be stabilized in the Al-doped HfO<subscript>2</subscript> film. As a result, the dielectric constant is enhanced up to about 35. The physical mechanism of the phase transition behavior is discussed from the viewpoint of thermodynamics and kinetics. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 16741056
- Volume :
- 26
- Issue :
- 2
- Database :
- Complementary Index
- Journal :
- Chinese Physics B
- Publication Type :
- Academic Journal
- Accession number :
- 121254744
- Full Text :
- https://doi.org/10.1088/1674-1056/26/2/027701