Back to Search Start Over

Highly stable hydrophobic SiNCO nanoparticle-modified silicon nitride membrane for zero-discharge water desalination.

Authors :
Wang, Jun‐Wei
Li, Lin
Gu, Jian‐Qiang
Yang, Ming‐Ye
Xu, Xin
Chen, Chu‐Sheng
Wang, Huan‐Ting
Agathopoulos, Simeon
Source :
AIChE Journal; Apr2017, Vol. 63 Issue 4, p1272-1277, 6p
Publication Year :
2017

Abstract

Membrane distillation water desalination can attain a significantly higher water recovery than reverse osmosis, while the lack of stable hydrophobic membranes limits its commercial applications. This article presents the preparation of a new hydrophobic membrane by modifying a porous Si<subscript>3</subscript>N<subscript>4</subscript> substrate with vesicular SiNCO nano-particles. The membrane had a water contact angle of 142°, due to the presence of -Si-CH<subscript>3</subscript> terminal groups and the high surface roughness. The contact angle remained nearly the same after exposures of the membrane to boiling water, aqueous solutions with pH ranging from 2 to 12, and benzene. The membrane exhibited satisfactory water desalination performance on highly concentrated NaCl solutions and simulated seawater. With the highly stable membrane, it is promising to develop a zero-discharge water desalination process for simultaneous production of fresh water for daily uses and brine for industrial uses. © 2016 American Institute of Chemical Engineers AIChE J, 63: 1272-1277, 2017 [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00011541
Volume :
63
Issue :
4
Database :
Complementary Index
Journal :
AIChE Journal
Publication Type :
Academic Journal
Accession number :
121921155
Full Text :
https://doi.org/10.1002/aic.15500