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Infrared gas phase study on plasma-polymer interactions in high-current diffuse dielectric barrier discharge.

Authors :
Liu, Y.
Welzel, S.
Starostin, S. A.
van de Sanden, M. C. M.
Engeln, R.
de Vries, H. W.
Source :
Journal of Applied Physics; 2017, Vol. 121 Issue 24, p1-8, 8p
Publication Year :
2017

Abstract

A roll-to-roll high-current diffuse dielectric barrier discharge at atmospheric pressure was operated in air and Ar/N<subscript>2</subscript>/O<subscript>2</subscript> gas mixtures. The exhaust gas from the discharge was studied using a high-resolution Fourier-transform infrared spectrometer in the range from 3000 to 750 cm<superscript>-1</superscript> to unravel the plasma-polymer interactions. The absorption features of H<subscript>x</subscript>N<subscript>y</subscript>O<subscript>z</subscript>, CO<subscript>x</subscript>, and HCOOH (formic acid) were identified, and the relative densities were deduced by fitting the absorption bands of the detected molecules. Strong interactions between plasma and polymer (Polyethylene-2,6-naphthalate, or PEN) in precursor-free oxygen-containing gas mixtures were observed as evidenced by a high CO<subscript>x</subscript> production. The presence of HCOOH in the gas effluent, formed through plasmachemical synthesis of CO<subscript>x</subscript>, turns out to be a sensitive indicator for etching. By adding tetraethylorthosilicate precursor in the plasma, dramatic changes in the CO<subscript>x</subscript> production were measured, and two distinct deposition regimes were identified. At high precursor flows, a good agreement with the precursor combustion and the CO<subscript>x</subscript> production was observed, whereas at low precursor flows an etching-deposition regime transpires, and the CO<subscript>x</subscript> production is dominated by polymer etching. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00218979
Volume :
121
Issue :
24
Database :
Complementary Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
123885098
Full Text :
https://doi.org/10.1063/1.4985619