Microstructure and thermal stability of rf-plasma-nitridated α-(AlGa)2O3 grown by mist CVD.

A new lattice-matching substrate material for the growth of AlGaN is proposed. This substrate is prepared by the rf-radical beam-based nitridation of α-(AlGa)₂O₃, which is grown by mist chemical vapor deposition (CVD). We consider the effect of the nitridation process using reflection high-energy electron diffraction (RHEED), transmission electron microscopy (TEM), scanning transmission electron microscopy-electron energy loss spectroscopy (STEM-EELS) and X-ray photoelectron spectroscopy (XPS). Surface of α-(AlGa)₂O₃ changed from corundum structure to wurtzite structure of AlGaN by nitridation using rf-radical beam was observed. In addition, we discuss the thermal stability of α-(AlGa)₂O₃. X-ray diffraction ω-2θ profile to characterize the phase transition was performed. [ABSTRACT FROM AUTHOR]