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Phase-Shifted Bragg Grating Inscription in PMMA Microstructured POF Using 248-nm UV Radiation.

Authors :
Pereira, Luis M.
Pospori, A.
Antunes, Paulo
Domingues, Maria Fatima
Marques, S.
Bang, Ole
Webb, David J.
Marques, Carlos A. F.
Source :
Journal of Lightwave Technology; Dec2017, Vol. 35 Issue 23, p5176-5184, 9p
Publication Year :
2017

Abstract

In this work, we experimentally validate and characterize the first phase-shifted polymer optical fiber Bragg gratings (PS-POFBGs) produced using a single pulse from a 248-nm krypton fluoride laser. A single-mode poly (methyl methacrylate) optical fiber with a core doped with benzyl dimethyl ketal for photosensitivity improvement was used. A uniform phase mask customized for 850-nm grating inscription was used to inscribe these Bragg structures. The phase shift defect was created directly during the grating inscription process by placing a narrow blocking aperture in the center of the UV beam. The produced high-quality Bragg grating structures, presenting a double dips, reject 16.3 dB (97.6% reflectivity) and 13.2 dB (95.2% reflectivity) of the transmitted power, being therefore appropriate for sensing or other photonic applications. Its transmission spectrum possesses two sharp transmission notches, allowing a significant increase in measurement resolution compared to direct interrogation of a single grating. The reflection and transmission spectra when multiple phase shifts are introduced in the fiber Bragg grating structure are also shown. The PS-POFBG's strain, temperature, pressure, and humidity characteristics have been experimentally analyzed in detail to assess their potential usage as sensors. [ABSTRACT FROM PUBLISHER]

Details

Language :
English
ISSN :
07338724
Volume :
35
Issue :
23
Database :
Complementary Index
Journal :
Journal of Lightwave Technology
Publication Type :
Academic Journal
Accession number :
127949336
Full Text :
https://doi.org/10.1109/JLT.2017.2771436