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A High‐Speed and Low‐Power Multistate Memory Based on Multiferroic Tunnel Junctions.

Authors :
Huang, Weichuan
Zhao, Wenbo
Luo, Zhen
Yin, Yuewei
Lin, Yue
Hou, Chuangming
Tian, Bobo
Duan, Chun‐Gang
Li, Xiao‐Guang
Source :
Advanced Electronic Materials; Apr2018, Vol. 4 Issue 4, p1-1, 6p
Publication Year :
2018

Abstract

Abstract: Ferroic‐order‐based devices are emerging as alternatives to high density, high switching speed, and low‐power memories. Here, multi‐nonvolatile resistive states with a switching speed of 6 ns and a write current density of about 3 × 10<superscript>3</superscript> A cm<superscript>−2</superscript> are demonstrated in crossbar‐structured memories based on all‐oxide La<subscript>0.7</subscript>Sr<subscript>0.3</subscript>MnO<subscript>3</subscript>/BaTiO<subscript>3</subscript>/La<subscript>0.7</subscript>Sr<subscript>0.3</subscript>MnO<subscript>3</subscript> multiferroic tunnel junctions. The tunneling resistive switching as a function of voltage pulse duration time, associated with the ferroelectric domain reversal dynamics, is ruled by the Kolmogorov–Avrami–Ishibashi switching model with a Lorentzian distribution of characteristic switching time. It is found that the characteristic resistance switching time decreases with increasing voltage pulse amplitude following Merz's law and the estimated write speed can be less than 6 ns at a relatively higher voltage. These findings highlight the potential application of multiferroic devices in high speed, low power, and high‐density memories. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
2199160X
Volume :
4
Issue :
4
Database :
Complementary Index
Journal :
Advanced Electronic Materials
Publication Type :
Academic Journal
Accession number :
129104307
Full Text :
https://doi.org/10.1002/aelm.201700560