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Improvement of Nano-imprint Lithography performance for device fabrication.

Authors :
Takuya Kono
Masayuki Hatano
Hiroshi Tokue
Kei Kobayashi
Hirokazu Kato
Masato Suzuki
Kazuya Fukuhara
Tetsuro Nakasugi
Eun Hyuk Choi
Wooyung Jung
Source :
Proceedings of SPIE; 1/12/2018, Vol. 10584, p1-9, 9p
Publication Year :
2018

Details

Language :
English
ISSN :
0277786X
Volume :
10584
Database :
Complementary Index
Journal :
Proceedings of SPIE
Publication Type :
Conference
Accession number :
130742980
Full Text :
https://doi.org/10.1117/12.2297294