Phosphinecarboxamide as an unexpected phosphorus precursor in the chemical vapour deposition of zinc phosphide thin films.

MLA

Beddoe, Samuel V. F., et al. “Phosphinecarboxamide as an Unexpected Phosphorus Precursor in the Chemical Vapour Deposition of Zinc Phosphide Thin Films.” Dalton Transactions: An International Journal of Inorganic Chemistry, vol. 47, no. 28, July 2018, pp. 9221–25. EBSCOhost, https://doi.org/10.1039/c8dt00544c.

APA

Beddoe, S. V. F., Cosham, S. D., Kulak, A. N., Jupp, A. R., Goicoechea, J. M., & Hyett, G. (2018). Phosphinecarboxamide as an unexpected phosphorus precursor in the chemical vapour deposition of zinc phosphide thin films. Dalton Transactions: An International Journal of Inorganic Chemistry, 47(28), 9221–9225. https://doi.org/10.1039/c8dt00544c

Chicago

Beddoe, Samuel V. F., Samuel D. Cosham, Alexander N. Kulak, Andrew R. Jupp, Jose M. Goicoechea, and Geoffrey Hyett. 2018. “Phosphinecarboxamide as an Unexpected Phosphorus Precursor in the Chemical Vapour Deposition of Zinc Phosphide Thin Films.” Dalton Transactions: An International Journal of Inorganic Chemistry 47 (28): 9221–25. doi:10.1039/c8dt00544c.