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Atomically sharp interlayer stacking shifts at anti-phase grain boundaries in overlapping MoS2 secondary layers.

Authors :
Zhou, Si
Wang, Shanshan
Shi, Zhe
Sawada, Hidetaka
Kirkland, Angus I.
Li, Ju
Warner, Jamie H.
Source :
Nanoscale; 9/21/2018, Vol. 10 Issue 35, p16692-16702, 11p
Publication Year :
2018

Details

Language :
English
ISSN :
20403364
Volume :
10
Issue :
35
Database :
Complementary Index
Journal :
Nanoscale
Publication Type :
Academic Journal
Accession number :
131745093
Full Text :
https://doi.org/10.1039/c8nr04486d