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Studying Resist Performance for Contact Holes Printing using EUV Interference Lithography.

Authors :
Xiaolong Wang
Li-Ting Tseng
Kazazis, Dimitrios
Tasdemir, Zuhal
Vockenhuber, Michaela
Mochi, Iacopo
Ekinci, Yasin
Source :
Proceedings of SPIE; 8/25/2018, Vol. 10809, p108091Z-1-108091Z-13, 13p
Publication Year :
2018

Details

Language :
English
ISSN :
0277786X
Volume :
10809
Database :
Complementary Index
Journal :
Proceedings of SPIE
Publication Type :
Conference
Accession number :
133396426
Full Text :
https://doi.org/10.1117/12.2501949