The Impact of Heat Treatment Technology and Parameters on TiO2 Thin Film Forming.

Nano-size titanium dioxide Ti_O2 is a kind of excellent photocatalyst material, especially after thin film preparation, lots of problems which easily appear in nano-powder material are successfully avoided. However, currently the manufacturing technology of titanium dioxide thin film is still immature. In the experiments of this paper, sol-gel method and spin coating technology are adopted, n-butyl titanate, acetic acid, acetylacetone, ethanol and deionized water are used as raw material for the preparation of Ti_O2 thin film. Process parameters for obtaining continuous uniform Ti_O2 thin film are as follows: the speed of spin-coating is 3000r/min, the pretreatment temperature is 80°C, pretreatment time span is 10 minutes, the heating rate from room temperature to 200°C is 0.5°C/min and 3°C/min at high-temperature. Crystalline film with anatase structure is obtained after annealing at 500°C and the crystallite size of Ti_O2 thin film is between 30 nm and 80 nm [ABSTRACT FROM AUTHOR]