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55‐3: Distinguished Paper: Development of G6 Exposure Tool for 1.2 µm Resolution.
- Source :
- SID Symposium Digest of Technical Papers; Jun2019, Vol. 50 Issue 1, p769-772, 4p
- Publication Year :
- 2019
-
Abstract
- We have proposed exposure method using Deep UV (DUV) exposure light to realize high resolution and high productivity in FPD lithography. [1] Here we show development concepts for our new G6 exposure tools with DUV light sources, and exposure test results with a test exposure tool. [ABSTRACT FROM AUTHOR]
- Subjects :
- LIGHT sources
MICROLITHOGRAPHY
LITHOGRAPHY
Subjects
Details
- Language :
- English
- ISSN :
- 0097966X
- Volume :
- 50
- Issue :
- 1
- Database :
- Complementary Index
- Journal :
- SID Symposium Digest of Technical Papers
- Publication Type :
- Academic Journal
- Accession number :
- 136710417
- Full Text :
- https://doi.org/10.1002/sdtp.13034