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Electron–Proton Co‐doping‐Induced Metal–Insulator Transition in VO2 Film via Surface Self‐Assembled l‐Ascorbic Acid Molecules.

Authors :
Li, Bowen
Xie, Liyan
Wang, Zhaowu
Chen, Shi
Ren, Hui
Chen, Yuliang
Wang, Chengming
Zhang, Guobin
Jiang, Jun
Zou, Chongwen
Source :
Angewandte Chemie International Edition; 9/23/2019, Vol. 58 Issue 39, p13711-13716, 6p
Publication Year :
2019

Abstract

Charge doping is an effective way to induce the metal–insulator transition (MIT) in correlated materials for many important utilizations, which is however practically limited by problem of low stability. An electron–proton co‐doping mechanism is used to achieve pronounced phase modulation of monoclinic vanadium dioxide (VO2) at room temperature. Using l‐ascorbic acid (AA) solution to treat VO2, the ionized AA− species donate electrons to the adsorbed VO2 surface. Charges then electrostatically attract surrounding protons to penetrate, and eventually results in stable hydrogen‐doped metallic VO2. The variations of electronic structures, especially the electron occupancy of V 3d/O 2p hybrid orbitals, were examined by synchrotron characterizations and first‐principle theoretical simulations. The adsorbed molecules protect hydrogen dopants from escaping out of lattice and thereby stabilize the metallic phase for VO2. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
14337851
Volume :
58
Issue :
39
Database :
Complementary Index
Journal :
Angewandte Chemie International Edition
Publication Type :
Academic Journal
Accession number :
138791838
Full Text :
https://doi.org/10.1002/anie.201904148