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Tunable broadband, wide angle and lithography-free absorber in the near-infrared using an ultrathin VO2 film.
- Source :
- Applied Physics Express; 7/1/2019, Vol. 12 Issue 7, p1-1, 1p
- Publication Year :
- 2019
-
Abstract
- We demonstrate a tunable broadband near-infrared absorber composed of VO<subscript>2</subscript> /Al<subscript>2</subscript>O<subscript>3</subscript>/ITO layers with a facile lithography-free method. Simulated and experimental spectra show that absorption bands with above 90% absorptance can be tuned from 1.62 ∼ 2.42 μm to 1.2 ∼ 1.5 μm by thermally induced VO<subscript>2</subscript> phase transition. Furthermore, the absorber with VO<subscript>2</subscript> in the intermediate state can yield a broadband perfect absorption over the wavelength range of 1.2 ∼ 2.5 μm. Besides high absorption performance can still be remained at the incident up to 70° for both polarizations due to the presence of ultrathin layer of VO<subscript>2</subscript> (λ/52) in the absorber. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 18820778
- Volume :
- 12
- Issue :
- 7
- Database :
- Complementary Index
- Journal :
- Applied Physics Express
- Publication Type :
- Academic Journal
- Accession number :
- 139000249
- Full Text :
- https://doi.org/10.7567/1882-0786/ab29e4