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Ferroelectric properties of gradient doped Y2O3:HfO2 thin films grown by pulsed laser deposition.
- Source :
- Applied Physics Letters; 10/14/2019, Vol. 115 Issue 16, pN.PAG-N.PAG, 4p, 3 Color Photographs, 1 Chart, 2 Graphs
- Publication Year :
- 2019
-
Abstract
- A HfO<subscript>2</subscript>-based thin film is a nanoscale ferroelectric material with a high-k dielectric and CMOS compatibility, which make it a promising candidate for high-performance electronics. Here, we demonstrate the synthesis of a ferroelectric Y-doped HfO<subscript>2</subscript> (HYO) thin film by pulsed laser deposition. This HYO thin film is gradient doped by alternately depositing a HfO<subscript>2</subscript> ceramic target and a Y<subscript>2</subscript>O<subscript>3</subscript> ceramic target. In the films, the orthorhombic phase, ferroelectric phase, is proved by grazing incidence x-ray diffraction and scanning transmission electron microscopy measurements. Moreover, the HYO thin film embraces outstanding ferroelectric and dielectric properties, its remanent polarization is up to 10.5 μC/cm<superscript>2</superscript>, and the dielectric constant is 27. The 180° inversion of the domain can be observed in a piezoelectric power microscopy image, while the phase contrast of the write domain fades with time. Therefore, this work provides a reliable approach to obtain a ferroelectric HYO thin film, which enables great potential in future high-performance nanoelectronics. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 00036951
- Volume :
- 115
- Issue :
- 16
- Database :
- Complementary Index
- Journal :
- Applied Physics Letters
- Publication Type :
- Academic Journal
- Accession number :
- 139218631
- Full Text :
- https://doi.org/10.1063/1.5121858