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Comprehensive Characterization of the 4H-SiC Planar and Trench Gate MOSFETs From Cryogenic to High Temperature.

Authors :
Tian, Kai
Hallen, Anders
Qi, Jinwei
Nawaz, Muhammad
Ma, Shenhui
Wang, Menghua
Guo, Shuwen
Elgammal, Karim
Li, Ange
Liu, Weihua
Source :
IEEE Transactions on Electron Devices; Oct2019, Vol. 66 Issue 10, p4279-4286, 8p
Publication Year :
2019

Abstract

In this article, the static, dynamic, and short-circuit properties of 1.2-kV commercial 4H-SiC planar and trench gate metal–oxide–semiconductor field-effect transistors (MOSFETs) are compared and analyzed in a wide temperature range from 90 to 493 K. The temperature-dependent specific ON-resistance (${R}_{\text {sp}- \mathrm{\scriptscriptstyle ON}}$) and threshold voltage (${V}_{\text {th}}$) are analyzed in relation to the density of the interface state. The turn-on rise and turn-off fall times (${T}_{r}$ and ${T}_{f}$) and the corresponding energy loss (${E}_{r}$ and ${E}_{f}$) are extracted from a double-pulse test from cryogenic to high temperature and analyzed. The short-circuit capability of the two structures is studied at low temperature for the first time. The comprehensive comparison and analysis of the planar and trench gate MOSFET versus temperature in this work show the importance to study applications with SiC MOSFETs in a wide temperature range, especially for the cryogenic temperatures. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00189383
Volume :
66
Issue :
10
Database :
Complementary Index
Journal :
IEEE Transactions on Electron Devices
Publication Type :
Academic Journal
Accession number :
139437509
Full Text :
https://doi.org/10.1109/TED.2019.2934507