MOCVD growth and characterization of TiO2 thin films for hydrogen gas sensor application.

Details

Language :

English

ISSN :

20531591

Volume :

6

Issue :

7

Database :

Complementary Index

Journal :

Materials Research Express

Publication Type :

Academic Journal

Accession number :

139663748

Full Text :

https://doi.org/10.1088/2053-1591/ab192b