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Recent development and application of thin-film thermoelectric cooler.

Authors :
Yu, Yuedong
Zhu, Wei
Kong, Xixia
Wang, Yaling
Zhu, Pengcheng
Deng, Yuan
Source :
Frontiers of Chemical Science & Engineering; Aug2020, Vol. 14 Issue 4, p492-503, 12p
Publication Year :
2020

Abstract

Recently, the performance and fabrication of thin-film thermoelectric materials have been largely enhanced. Based on this enhancement, the thin-film thermoelectric cooler (TEC) is becoming a research hot topic, due to its high cooling flux and microchip level size. To fulfill a thin-film TEC, interfacial problems are unavoidable, as they may largely reduce the properties of a thin-film TEC. Moreover, the architecture of a thin-film TEC should also be properly designed. In this review, we introduced the enhancement of thermoelectric properties of (Bi,Sb)<subscript>2</subscript>(Te,Se)<subscript>3</subscript> solid solution materials by chemical vapor deposition, physical vapor deposition and electrodeposition. Then, the interfacial problems, including contact resistance, interfacial diffusion and thermal contact resistance, were discussed. Furthermore, the design, fabrication, as well as the performance of thin-film TECs were summarized. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
20950179
Volume :
14
Issue :
4
Database :
Complementary Index
Journal :
Frontiers of Chemical Science & Engineering
Publication Type :
Academic Journal
Accession number :
143506949
Full Text :
https://doi.org/10.1007/s11705-019-1829-9