Mask absorber for next generation EUV lithography.

MLA

Naulleau, Patrick P., et al. “Mask Absorber for next Generation EUV Lithography.” Proceedings of SPIE, vol. 11517, Aug. 2020, p. 1151706. EBSCOhost, https://doi.org/10.1117/12.2572114.

APA

Naulleau, P. P., Gargini, P. A., Itani, T., Ronse, K. G., Wu, M., Thakare, D., de Marneffe, J.-F., Jaenen, P., Souriau, L., Opsomer, K., Soulié, J.-P., Erdmann, A., Mesilhy, H., Naujok, P., Foltin, M., Soltwisch, V., Saadeh, Q., & Philipsen, V. (2020). Mask absorber for next generation EUV lithography. Proceedings of SPIE, 11517, 1151706. https://doi.org/10.1117/12.2572114

Chicago

Naulleau, Patrick P., Paolo A. Gargini, Toshiro Itani, Kurt G. Ronse, Meiyi Wu, Devesh Thakare, Jean-François de Marneffe, et al. 2020. “Mask Absorber for next Generation EUV Lithography.” Proceedings of SPIE 11517 (August): 1151706. doi:10.1117/12.2572114.