Boron Incorporation and Its Effect on Electronic Properties of Ge:H Films Deposited by LF Plasma.

Details

Language :

English

ISSN :

19464274

Volume :

1066

Issue :

1

Database :

Complementary Index

Journal :

MRS Online Proceedings Library

Publication Type :

Conference

Accession number :

148039485

Full Text :

https://doi.org/10.1557/PROC-1066-A05-04