Back to Search
Start Over
Diffusion of ion-implanted Boron and Silicon in Germanium.
- Source :
- MRS Online Proceedings Library; 204, Vol. 809 Issue 1, p1-6, 6p
- Publication Year :
- 2004
Details
- Language :
- English
- ISSN :
- 19464274
- Volume :
- 809
- Issue :
- 1
- Database :
- Complementary Index
- Journal :
- MRS Online Proceedings Library
- Publication Type :
- Conference
- Accession number :
- 148699601
- Full Text :
- https://doi.org/10.1557/PROC-809-B8.10