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Facile synthesis of nitrogen-doped and boron-doped reduced graphene oxide using radio-frequency plasma for supercapacitors.
- Source :
- Journal of Physics D: Applied Physics; Jul2021, Vol. 54 Issue 26, p1-12, 12p
- Publication Year :
- 2021
-
Abstract
- Heteroatom doping is an effective method to improve the capacitive performance of graphene-based materials. In this work, a facile and efficient radio-frequency (RF) plasma treatment strategy has been employed to achieve simultaneous doping and reduction of graphene oxide (GO). As a result, boron-doped and nitrogen-doped reduced graphene oxide (denoted as B-rGO and N-rGO) have been synthesized rapidly under relatively low temperatures compared with conventional thermal methods. The B-rGO and N-rGO present significantly improved specific capacitances as high as 345 F g<superscript>−1</superscript> and 365 F g<superscript>−1</superscript> at 0.2 A g<superscript>−1</superscript>, respectively, exhibiting a fourfold increase compared to that of GO before plasma treatment. Interestingly, the N-rGO shows better rate capability than the B-rGO. Furthermore, the mechanism of simultaneous doping and reduction by RF plasma treatment is discussed based on the diagnosis of emission spectroscopy. The high energy electrons and plasma-excited ions and radicals render effective reduction, etching, and doping of GO at the same time. Compared with high-temperature carbonization and wet chemical methods, our plasma treatment method is more energy-saving and eco-friendly. We believe this rapid and straightforward plasma treatment method reported here can be extended to the incorporation of various heteroatoms into graphene lattice for broad applications. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 00223727
- Volume :
- 54
- Issue :
- 26
- Database :
- Complementary Index
- Journal :
- Journal of Physics D: Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 150087361
- Full Text :
- https://doi.org/10.1088/1361-6463/abf78c