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HfSiOx-gate GaN MOS-HEMTs for RF power transistor.

Authors :
Fujioka, Hiroshi
MorkoƧ, Hadis
Schwarz, Ulrich T.
Hashizume, Tamotsu
Ochi, Ryota
Maeda, Erika
Nabatame, Toshihide
Shiozaki, Koji
Sato, Taketomo
Source :
Proceedings of SPIE; 1/18/2021, Vol. 11686, p1168628-1168628, 1p
Publication Year :
2021

Details

Language :
English
ISSN :
0277786X
Volume :
11686
Database :
Complementary Index
Journal :
Proceedings of SPIE
Publication Type :
Conference
Accession number :
150286404
Full Text :
https://doi.org/10.1117/12.2577403