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The analysis of the stress distribution around angulated and parallelly placed implants based on "all on 4 concept" and four implants placed parallel within the interforaminal distance in an edentulous mandible – An in vitro three-dimensional finite element analysis

Authors :
Mahantshetty, Minal
Thumati, Prafulla
Ayinala, Mounika
Source :
Journal of Dental Implants; Jan-Jun2021, Vol. 11 Issue 1, p44-52, 9p
Publication Year :
2021

Abstract

Purpose: The purpose of the study was to analyze and compare the stress distribution in the so-called All-on-Four concept where two anterior implants were placed parallel to each other and two posterior implants were tilted at 45° angle against the four parallelly placed implants within the interforaminal distance in an edentulous mandible. Materials and Methods: The three-dimensional finite element analysis models consisted of cancellous bone surrounded by the cortical bone, four dental implants positioned in two different designs – i.e., four parallelly placed implants (Model 1) and All-on-Four concept (Model 2) with hybrid superstructures comprising of a Hader bar. The vertical (60N, 130N, and 300N) and lateral (20N, 45N, and 100N) loading protocols were considered and von Mises stress values were determined. Results: On vertical and lateral loading, lower stress concentrations were observed in the peri-implant region in Model 2. However, there was higher stress concentration noticed on cortical, cancellous bone and bar attachment due to the tilting of implants in every condition. Conclusion: Within the limitations of the study, All-on-Four concept is an optimal and viable treatment option if executed accurately as it reduces the cantilever length, reduces stress concentrations in the peri-implant region, and is cost-effective. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
09746781
Volume :
11
Issue :
1
Database :
Complementary Index
Journal :
Journal of Dental Implants
Publication Type :
Academic Journal
Accession number :
150913335
Full Text :
https://doi.org/10.4103/jdi.jdi_28_20