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Highly selective adsorption of SO2 on WX2 (X = S, Se, Te) monolayers and the effect of strain engineering: a DFT study.
- Source :
- Journal of Computational Electronics; Oct2021, Vol. 20 Issue 5, p1874-1883, 10p
- Publication Year :
- 2021
-
Abstract
- A model of the SO<subscript>2</subscript> molecule is first established, then its adsorption on various monolayers is studied by using a first-principles method. The calculation results show that intrinsic WX<subscript>2</subscript> (X = S, Se, Te) exhibits weak adsorption of SO<subscript>2</subscript>, corresponding to a physical adsorption mechanism. The adsorption of SO<subscript>2</subscript> on the WX<subscript>2</subscript> systems doped with As and Ge is calculated and compared based on the first-principles method, revealing that the doped WX<subscript>2</subscript> materials exhibit stronger adsorption of SO<subscript>2</subscript>. The single-doped Ge/WTe<subscript>2</subscript> shows greater stability when adsorbing gas molecules according to the degree of change in the structure, while its adsorption energy, charge density, band structure, and density-of-states diagrams confirm its enhanced adsorption characteristics for SO<subscript>2</subscript> gas. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 15698025
- Volume :
- 20
- Issue :
- 5
- Database :
- Complementary Index
- Journal :
- Journal of Computational Electronics
- Publication Type :
- Academic Journal
- Accession number :
- 152767755
- Full Text :
- https://doi.org/10.1007/s10825-021-01757-w