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Normally-Off p-GaN Gated AlGaN/GaN MIS-HEMTs with ALD-Grown Al 2 O 3 /AlN Composite Gate Insulator.
- Source :
- Membranes; Oct2021, Vol. 11 Issue 10, p727-727, 1p
- Publication Year :
- 2021
-
Abstract
- A metal–insulator–semiconductor p-type GaN gate high-electron-mobility transistor (MIS-HEMT) with an Al<subscript>2</subscript>O<subscript>3</subscript>/AlN gate insulator layer deposited through atomic layer deposition was investigated. A favorable interface was observed between the selected insulator, atomic layer deposition–grown AlN, and GaN. A conventional p-type enhancement-mode GaN device without an Al<subscript>2</subscript>O<subscript>3</subscript>/AlN layer, known as a Schottky gate (SG) p-GaN HEMT, was also fabricated for comparison. Because of the presence of the Al<subscript>2</subscript>O<subscript>3</subscript>/AlN layer, the gate leakage and threshold voltage of the MIS-HEMT improved more than those of the SG-HEMT did. Additionally, a high turn-on voltage was obtained. The MIS-HEMT was shown to be reliable with a long lifetime. Hence, growing a high-quality Al<subscript>2</subscript>O<subscript>3</subscript>/AlN layer in an HEMT can help realize a high-performance enhancement-mode transistor with high stability, a large gate swing region, and high reliability. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 20770375
- Volume :
- 11
- Issue :
- 10
- Database :
- Complementary Index
- Journal :
- Membranes
- Publication Type :
- Academic Journal
- Accession number :
- 153347316
- Full Text :
- https://doi.org/10.3390/membranes11100727