Fast homoepitaxial growth of (100) β-Ga2O3 thin films via MOVPE.

A high growth rate process above 1 µm/h was achieved for Si-doped (100) β-Ga₂O₃ homoepitaxial films grown via metalorganic vapor phase epitaxy (MOVPE) while maintaining high crystalline perfection up to a film thickness of 3 µm. The main growth parameters were investigated to increase the growth rate and maintain the step-flow growth mode, wherein the enhanced diffusion channel due to the formation of a Ga adlayer was proposed to be the possible growth mechanism. Si doping allowed precise control of the n-type conductivity of the films with electron concentrations ranging from 1.5 × 10¹⁷ to 1.5 × 10¹⁹ cm⁻³ and corresponding mobilities from 144 to 21 cm² V⁻¹ s⁻¹, as revealed by Hall effect measurements at room temperature. Secondary ion mass spectrometry confirmed homogeneous Si doping through the film and a one-to-one correlation between the Si concentration and the electron concentration. Low defect density in the films was determined by x-ray diffraction measurements. The demonstration of a high growth rate process of β-Ga₂O₃ films with μm level thickness and smooth surface morphology via MOVPE is critical for high power electronics with vertical device architecture. [ABSTRACT FROM AUTHOR]