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Analysis of the n-GaN electrochemical etching process and its mechanism in oxalic acid.

Authors :
Shushanian, Artem
Iida, Daisuke
Zhuang, Zhe
Han, Yu
Ohkawa, Kazuhiro
Source :
RSC Advances; 2022, Vol. 12 Issue 8, p4648-4655, 8p
Publication Year :
2022

Details

Language :
English
ISSN :
20462069
Volume :
12
Issue :
8
Database :
Complementary Index
Journal :
RSC Advances
Publication Type :
Academic Journal
Accession number :
155178898
Full Text :
https://doi.org/10.1039/d1ra07992a