Advanced Microelectronics Metrology Workshop.

He also presented the capabilities of the NIST beamlines at the NSLS-II and the NIST-BNL vision for developing advanced synchrotron metrology methods in collaboration with -industry. A workshop titled "Advanced Metrology Needs for Addressing Critical Microelectronics Challenges" was held during the virtual NSLS-II and CFN Joint Users' Meeting at Brookhaven National Laboratory (BNL) on May 25, 2022. Dr. Papa Rao emphasized the potential roles of national laboratories and their user facilities such as synchrotron X-ray sources, stressing the need for easier user access for semiconductor research and wafer-scale, in-operando, and high-resolution metrology capabilities. [Extracted from the article]