The Insertion of EII and EIV Chlorides (E=Si, Ge) into the Si−Si Bond of Disilylene.

Reactions of silicon and germanium dichlorides L⋅ECl2 (E=Si, L=IPr; E=Ge, L=dioxane) with the phosphinoamidinato‐supported disilylene ({κ2(N,P)‐NNP}Si)2 resulted in formal tetrylene insertions into the Si−Si bond. In the case of the reaction with silylene, two products were isolated. The first product ({κ2(N,P)‐NNP}Si)2SiCl2, is the formal product of direct SiCl2 insertion into the Si−Si bond of ({κ2(N,P)‐NNP}Si)2 and thus features two separated silylamido silylene centers. Over time, migration of the SiCl2 group to a lateral position afforded the second product, the disilylene {κ2(Si,P)−SiCl2NNP}Si−Si{κ2(N,P)‐NNP}. In contrast, insertion of GeCl2 resulted only in the isolation of the germanium analogue of {κ2(Si,P)−SiCl2NNP}Si−Si{κ2(N,P)‐NNP}, containing a Ge atom in the central position namely, compound {κ2(Si,P)−SiCl2NNP}Ge−Si{κ2(N,P)‐NNP}, which is a rare example of a silylene‐germylene. Finally, reaction of disilylene ({κ2(N,P)−NNP}Si)2 with SiCl4 and SiHCl3 led to the formation of the new bis(silyl)silylene, ({NNP}SiCl2)2Si:. All four new products from these insertion reactions have been characterized by multinuclear NMR and single‐crystal X‐ray diffraction studies. [ABSTRACT FROM AUTHOR]